Beneq Announces Advanced ALD Precision Optical Coating Technology with a Diameter of 600mm at OPTO TAIWAN 2022
Beneq rolled out its latest P800 ALD coating equipment at the “Micro Optics & Coating Seminar for Display and Metaverse Application” seminar held on at the Nankang Exhibition Hall on Oct.26th, aiming to provide customers with cutting edge process equipment with robust functions.
Atomic Layer Deposition (ALD) is a new generation of semiconductor process technology. Compared with common thin film deposition methods, it can accurately control the film thickness and quality by using the number of cycles, and has good uniformity and high aspect ratio. Features have been widely adopted by enterprises.
Beneq, the leading company of Netherlands is the home of ALD, with R&D, semiconductor device manufacturing, volume production, space ALD and roll-to-roll ALD design and manufacture of leading ALD equipment products. The newly introduced P800 equipment is sized to coat parts larger than 600mm in diameter, or use the P800's capacity to easily scale up batches of smaller parts without compromising film quality and uniformity.
The ruggedness of the Beneq P800, equipped with a high-capacity precursor source, deactivation and filtration system, enables easy deposition of micron-thick thin film deposition stacks. Its flexibility, offering customizable reaction chamber dimensions, is optimized for the customer's substrate and application. Reaction chambers are easily switchable for easy maintenance and maximum machine uptime.